Issue 17, 2019

Hierarchical multi-level block copolymer patterns by multiple self-assembly

Abstract

Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high χ. The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (∼800 °C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.

Graphical abstract: Hierarchical multi-level block copolymer patterns by multiple self-assembly

Supplementary files

Article information

Article type
Paper
Submitted
25 Jan 2019
Accepted
29 Mar 2019
First published
01 Apr 2019

Nanoscale, 2019,11, 8433-8441

Hierarchical multi-level block copolymer patterns by multiple self-assembly

H. Jung, W. H. Shin, T. W. Park, Y. J. Choi, Y. J. Yoon, S. H. Park, J. Lim, J. Kwon, J. W. Lee, S. Kwon, G. H. Seong, K. H. Kim and W. I. Park, Nanoscale, 2019, 11, 8433 DOI: 10.1039/C9NR00774A

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