Atomically dispersed metal sites stabilized on a nitrogen doped carbon carrier via N2 glow-discharge plasma

Abstract

A novel, facile and universal N₂ plasma approach to form single atom metal sites (Pt, Pd, Ag, Cu, and Co) is proposed. Fast nucleation and slow growth of metal ions under low temperature plasma are the premise to form single atoms. These isolated metal atoms are subsequently trapped by in situ doped nitrogen. We provide a new route to expand the toolbox of single-atoms preparation.