Issue 19, 2009

Localized heating on silicon field effect transistors: Device fabrication and temperature measurements in fluid

Abstract

We demonstrate electrically addressable localized heating in fluid at the dielectric surface of silicon-on-insulator field-effect transistors via radio-frequency Joule heating of mobile ions in the Debye layer. Measurement of fluid temperatures in close vicinity to surfaces poses a challenge due to the localized nature of the temperature profile. To address this, we developed a localized thermometry technique based on the fluorescence decay rate of covalently attached fluorophores to extract the temperature within 2 nm of any oxide surface. We demonstrate precise spatial control of voltage dependent temperature profiles on the transistor surfaces. Our results introduce a new dimension to present sensing systems by enabling dual purpose silicon transistor-heaters that serve both as field effect sensors as well as temperature controllers that could perform localized bio-chemical reactions in Lab on Chip applications.

Graphical abstract: Localized heating on silicon field effect transistors: Device fabrication and temperature measurements in fluid

Article information

Article type
Paper
Submitted
26 Mar 2009
Accepted
21 Jul 2009
First published
06 Aug 2009

Lab Chip, 2009,9, 2789-2795

Localized heating on silicon field effect transistors: Device fabrication and temperature measurements in fluid

O. H. Elibol, B. Reddy Jr., P. R. Nair, B. Dorvel, F. Butler, Z. S. Ahsan, D. E. Bergstrom, M. A. Alam and R. Bashir, Lab Chip, 2009, 9, 2789 DOI: 10.1039/B906048K

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