Issue 3, 2009
From the journal:

Nanoscale

UV-assisted capillary force lithography for engineering biomimetic multiscale hierarchical structures: From lotus leaf to gecko foot hairs

Hoon Eui Jeong,a   Rhokyun Kwak,a   Ali Khademhosseinibc  and  Kahp Y. Suh*ad  

* Corresponding authors

a School of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea
E-mail: sky4u@snu.ac.kr

b Center for Biomedical Engineering, Department of Medicine, Brigham and Women's Hospital, Harvard Medical School, Boston, MA 021158, USA

c Harvard-MIT Division of Health Sciences and Technology, Massachusetts Institute of Technology, Cambridge, MA 02139, USA

d World Class University Program on Multiscale Mechanical Design, Seoul National University, Seoul 151-742, Korea

Abstract

This feature article provides an overview of the recently developed two-step UV-assisted capillary force lithography and its application to fabricating well-defined micro/nanoscale hierarchical structures. This method utilizes an oxygen inhibition effect in the course of UV irradiation curing and a two-step moulding process, to form multiscale hierarchical or suspended nanobridge structures in a rapid and reproducible manner. After a brief description of the fabrication principles, several examples of the two-step UV-assisted moulding technique are presented. In addition, emerging applications of the multiscale hierarchical structures are briefly described.

Graphical abstract: UV-assisted capillary force lithography for engineering biomimetic multiscale hierarchical structures: From lotus leaf to gecko foot hairs

About
Cited by
Related
Download options Please wait...

Article information

DOI
https://doi.org/10.1039/B9NR00106A
Article type
Feature Article
Submitted
09 Jun 2009
Accepted
24 Aug 2009
First published
01 Oct 2009

Nanoscale, 2009,1, 331-338

Permissions

Request permissions

UV-assisted capillary force lithography for engineering biomimetic multiscale hierarchical structures: From lotus leaf to gecko foot hairs

H. E. Jeong, R. Kwak, A. Khademhosseini and K. Y. Suh, Nanoscale, 2009, 1, 331 DOI: 10.1039/B9NR00106A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements