Issue 42, 2013

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

Abstract

Large-scale highly ordered ZnO nanorod arrays with precise period control and uniform distribution are easily fabricated via three-beam interference lithography, top anti-reflective coating and hydrothermal synthesis. This new method demonstrates an efficient way to fabricate large-scale highly ordered semiconductor nanorod arrays and could meet the needs of nanomaterial design, nanodevice optimization and nanosystem integration.

Graphical abstract: High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

Supplementary files

Article information

Article type
Communication
Submitted
04 Aug 2013
Accepted
23 Aug 2013
First published
23 Aug 2013

CrystEngComm, 2013,15, 8416-8421

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

X. Chen, X. Yan, Z. Bai, Y. Shen, Z. Wang, X. Dong, X. Duan and Y. Zhang, CrystEngComm, 2013, 15, 8416 DOI: 10.1039/C3CE41558A

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