Connectivity enhancement of highly porous WO3 nanostructured thin films by in situ growth of K0.33WO3 nanowires

Julien Gaury; Ugo Lafont; Eugene Bychkov; Andreas Schmidt-Ott; George Biskos

doi:10.1039/C3CE42078G

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Connectivity enhancement of highly porous WO₃ nanostructured thin films by in situ growth of K_0.33WO₃ nanowires†

Julien Gaury,^a Ugo Lafont,^b Eugene Bychkov,^c Andreas Schmidt-Ott^a and George Biskos*^ad

Author affiliations

* Corresponding authors

^a Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628BL Delft, The Netherlands
E-mail: g.biskos@tudelft.nl, biskos@aegean.gr

^b Aerospace Engineering, Delft University of Technology, Kluyver 1, 2629HS Delft, The Netherlands

^c Laboratoire de Physico-Chimie de l'Atmosphère, Université du Littoral Cote d'Opale, 189A Avenue Maurice Schumann, 59140 Dunkerque, France

^d Department of Environment, University of the Aegean, University Hill, 81100 Mytilene, Greece

Abstract

A simple method of enhancing the connectivity between WO₃ tree-like structures produced by Electrostatic Spray Deposition (ESD) has been achieved using in situ growth of K_0.33WO₃ nanowires. The resulting films exhibit a substantially lower electrical resistance without loss of their initial nanostructured morphology.

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Article information

DOI: https://doi.org/10.1039/C3CE42078G
Article type: Communication
Submitted: 14 Oct 2013
Accepted: 11 Nov 2013
First published: 11 Nov 2013

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CrystEngComm, 2014,16, 1228-1231

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Connectivity enhancement of highly porous WO₃ nanostructured thin films by in situ growth of K_0.33WO₃ nanowires

J. Gaury, U. Lafont, E. Bychkov, A. Schmidt-Ott and G. Biskos, CrystEngComm, 2014, 16, 1228 DOI: 10.1039/C3CE42078G

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