Issue 63, 2015
From the journal:

Chemical Communications

Antifogging antireflective thin films: does the antifogging layer have to be the outmost layer?†

Xiaojie Zhangab  and  Junhui He*a  

* Corresponding authors

a Functional Nanomaterials Laboratory, Center for Micro/Nanomaterials and Technology and Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Zhongguancundonglu 29, Haidianqu, Beijing 100190, China
E-mail: jhhe@mail.ipc.ac.cn

b University of Chinese Academy of Sciences, Beijing 100864, China

Abstract

Unusual antifogging antireflective thin films with a maximum transmittance of 98.9% have been realized surprisingly by depositing a hollow silica nanoparticle layer on top of an antifogging polymer layer, which was considered as an irrational design according to the previous knowledge.

Graphical abstract: Antifogging antireflective thin films: does the antifogging layer have to be the outmost layer?

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Article information

DOI
https://doi.org/10.1039/C5CC04465K
Article type
Communication
Submitted
01 Jun 2015
Accepted
30 Jun 2015
First published
30 Jun 2015

Chem. Commun., 2015,51, 12661-12664

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Antifogging antireflective thin films: does the antifogging layer have to be the outmost layer?

X. Zhang and J. He, Chem. Commun., 2015, 51, 12661 DOI: 10.1039/C5CC04465K

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