Issue 4, 1998

Infrared spectroscopic ellipsometry:a tool for characterizing nanometer layers†

Abstract

An overview of applications of infrared spectrometric ellipsometry for characterizing samples which consist of a metal, semiconductor or organic layer on a variety of substrates is given. The thicknesses addressed cover the entire nanometer range. Both anisotropy and inhomogeneity of the layers are considered.

Article information

Article type
Paper

Analyst, 1998,123, 647-651

Infrared spectroscopic ellipsometry:a tool for characterizing nanometer layers†

E. H. Korte and A. Röseler, Analyst, 1998, 123, 647 DOI: 10.1039/A707112D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements