Issue 18, 2004

Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films

Abstract

Magnetic nanodot arrays were prepared from thin film templates of cylinder-forming polystyrene-polylactide diblock copolymers by first annealing the films to obtain PLA cylinders oriented perpendicular to the surface, then selectively staining the PS matrix with RuO4 vapors, followed by etching the cylinders by O2-reactive ion etching. Metal was then deposited by molecular beam deposition and finally the polymer mask was lifted off.

Graphical abstract: Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films

Article information

Article type
Communication
Submitted
08 Jun 2004
Accepted
10 Aug 2004
First published
18 Aug 2004

J. Mater. Chem., 2004,14, 2729-2731

Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films

R. Olayo-Valles, M. S. Lund, C. Leighton and M. A. Hillmyer, J. Mater. Chem., 2004, 14, 2729 DOI: 10.1039/B408639B

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