Issue 8, 2006
From the journal:

Journal of Analytical Atomic Spectrometry

UV-femtosecond and nanosecond laser ablation-ICP-MS: internal and external repeatability

Jhanis González,a   Siv H. Dundas,b   Chun Yi Liu,a   Xianglei Maoa  and  Richard E. Russo*a  

* Corresponding authors

a Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

b Geological Survey of Norway, N-7491 Trondheim, Norway
E-mail: rerusso@lbl.gov
Fax: +1-510-483-7303
Tel: +1-510-486-4258

Abstract

The internal (precision within an ablation spot) and external repeatability (precision between ablation spots on the sample) were evaluated during repetitive 266 nm femtosecond and nanosecond laser ablation-inductively coupled plasma spectrometry. Femtosecond laser ablation sampling into the ICP-MS improved the precision by reducing systematic errors related to the particle size distribution and resultant spikes on the signal intensity. The data are reported in terms of measured concentrations for several elements in silica glass reference materials NIST 610-612.

Graphical abstract: UV-femtosecond and nanosecond laser ablation-ICP-MS: internal and external repeatability

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Article information

DOI
https://doi.org/10.1039/B603492F
Article type
Technical Note
Submitted
07 Mar 2006
Accepted
29 Jun 2006
First published
11 Jul 2006

J. Anal. At. Spectrom., 2006,21, 778-784

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UV-femtosecond and nanosecond laser ablation-ICP-MS: internal and external repeatability

J. González, S. H. Dundas, C. Yi Liu, X. Mao and R. E. Russo, J. Anal. At. Spectrom., 2006, 21, 778 DOI: 10.1039/B603492F

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