Issue 31, 2009

Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

Abstract

A combination of unique solvent properties of hydrazine enables the direct dissolution of a range of metal chalcogenides at ambient temperature, rendering this an extraordinarily simple and soft synthetic approach to prepare new metal chalcogenide-based materials. The extended metal chalcogenide parent framework is broken up during this process, and the resulting metal chalcogenide building units are re-organized into network structures (from 0D to 3D) based upon their interactions with the hydrazine/hydrazinium moieties. This Perspective will review recent crystal and materials chemistry developments within this family of compounds and will briefly discuss the utility of this approach in metal chalcogenide thin-film deposition.

Graphical abstract: Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

Article information

Article type
Perspective
Submitted
12 Jan 2009
Accepted
18 Mar 2009
First published
20 Apr 2009

Dalton Trans., 2009, 6078-6088

Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

M. Yuan and D. B. Mitzi, Dalton Trans., 2009, 6078 DOI: 10.1039/B900617F

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