Issue 48, 2010

Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

Abstract

Thin films of organic–inorganic hybrid materials have been grown by the atomic layer deposition (ALD) technique, using trimethylaluminium (TMA) and aromatic carboxylic acids such as 1,2-benzene dicarboxylic acid, 1,3-benzene dicarboxylic acid, 1,4-benzene dicarboxylic acid, 1,3,5-benzene tricarboxylic acid, 1,2,4,5-benzene tetracarboxylic acid as precursors. Growth rates as function of temperature show that all systems, with the exception of the benzoic acidTMA system, possess ALD-windows and provides growth rates in the range of 0.25–1.34 nm/cycle. X-ray diffraction studies of the as-deposited films reveal their amorphous character, which is also supported by very low surface roughness as measured by atomic force microscopy. As-deposited films were investigated by Fourier Transform Infrared Spectroscopy proving that the deposited films are of a hybrid character.

Graphical abstract: Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

Article information

Article type
Paper
Submitted
09 Jul 2010
Accepted
17 Sep 2010
First published
01 Nov 2010

Dalton Trans., 2010,39, 11628-11635

Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

K. B. Klepper, O. Nilsen and H. Fjellvåg, Dalton Trans., 2010, 39, 11628 DOI: 10.1039/C0DT00817F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements