Issue 34, 2011
From the journal:

Chemical Communications

Highly qualified reduced graphene oxides: the best chemical reduction†

In Kyu Moon,a   Junghyun Leea  and  Hyoyoung Lee*a  

* Corresponding authors

a NCRI, Center for Smart Molecular Memory, Department of Chemistry, Samsung-SKKU Graphene Center, Sungkyunkwan University, Suwon 440-746, Republic of Korea
E-mail: hyoyoung@skku.edu
Fax: +82-31-299-5934
Tel: +82-31-299-4566

Abstract

We report new step-by-step reduction methods by alternating two different reducing reagents with the order of hydrazine with NH3 (NH)/HI in acetic acid (HI) and the reverse order (HI/NH) to understand nitrogen incorporation and removal or reduction for providing highly qualified reduced graphene oxides (rGOs).

Graphical abstract: Highly qualified reduced graphene oxides: the best chemical reduction

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C1CC13312H
Article type
Communication
Submitted
03 Jun 2011
Accepted
08 Jul 2011
First published
22 Jul 2011

Chem. Commun., 2011,47, 9681-9683

Permissions

Request permissions

Highly qualified reduced graphene oxides: the best chemical reduction

I. K. Moon, J. Lee and H. Lee, Chem. Commun., 2011, 47, 9681 DOI: 10.1039/C1CC13312H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements