Issue 42, 2011

Direct patterning of quantum dot nanostructuresviaelectron beam lithography

Abstract

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Graphical abstract: Direct patterning of quantum dot nanostructuresviaelectron beam lithography

Supplementary files

Article information

Article type
Communication
Submitted
22 Apr 2011
Accepted
08 Jul 2011
First published
25 Jul 2011

J. Mater. Chem., 2011,21, 16859-16862

Direct patterning of quantum dot nanostructuresviaelectron beam lithography

V. Nandwana, C. Subramani, Y. Yeh, B. Yang, S. Dickert, M. D. Barnes, M. T. Tuominen and V. M. Rotello, J. Mater. Chem., 2011, 21, 16859 DOI: 10.1039/C1JM11782C

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