Issue 39, 2011

Iodine doping in solid precursor-based CVD growth graphene film

Abstract

Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.

Graphical abstract: Iodine doping in solid precursor-based CVD growth graphene film

Article information

Article type
Communication
Submitted
13 Jul 2011
Accepted
19 Aug 2011
First published
07 Sep 2011

J. Mater. Chem., 2011,21, 15209-15213

Iodine doping in solid precursor-based CVD growth graphene film

G. Kalita, K. Wakita, M. Takahashi and M. Umeno, J. Mater. Chem., 2011, 21, 15209 DOI: 10.1039/C1JM13268G

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