Issue 15, 2011
From the journal:

Soft Matter

Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups†

Olivier Bertrand,‡a   Jean-Marc Schumers,‡a   Chandrasekar Kuppan,a   Jacqueline Marchand-Brynaert,b   Charles-André Fustin*a  and  Jean-François Gohy*a  

* Corresponding authors

a Institute of Condensed Matter and Nanosciences (IMCN), Bio- and Soft matter (BSMA), Université catholique de Louvain, Place L. Pasteur 1, Louvain-la-Neuve, Belgium
E-mail: charles-andre.fustin@uclouvain.be, jean-francois.gohy@uclouvain.be

b Institute of Condensed Matter and Nanosciences (IMCN), Molecules, Solids and Reactivity (MOST), Université catholique de Louvain, Place L. Pasteur 1, Louvain-la-Neuve, Belgium

Abstract

The synthesis of photocleavable poly(dimethoxynitrobenzyl acrylate)-block-polystyrene block copolymers is described. The UV irradiation of these block copolymers, dissolved in a good solvent for both blocks, selectively cleaves the dimethoxynitrobenzyl protecting groups, leading to carboxylic acid moieties. Since the resulting hydrophilic poly(acrylic acid) block is insoluble in the solvent used, self-assembly of the diblocks into micelles is observed. This light-induced micellization process is further used to trap dyes into the core of the micelles.

Graphical abstract: Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups

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Article information

DOI
https://doi.org/10.1039/C1SM05631J
Article type
Paper
Submitted
08 Apr 2011
Accepted
14 May 2011
First published
20 Jun 2011

Soft Matter, 2011,7, 6891-6896

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Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups

O. Bertrand, J. Schumers, C. Kuppan, J. Marchand-Brynaert, C. Fustin and J. Gohy, Soft Matter, 2011, 7, 6891 DOI: 10.1039/C1SM05631J

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