Issue 22, 2012

Antireflective silicananoparticle array directly deposited on flexible polymer substrates by chemical vapor deposition

Abstract

We report the direct coating of a novel antireflective (AR) nanoarray structure of silica nanoparticles on highly flexible polymer substrates by a conventional vacuum coating method using plasma-enhanced chemical vapor deposition. Globular-shaped silica nanoparticles are found to be self-arranged in a periodic pattern on subwavelength scales without the use of artificial assemblies that typically require complicated nanolithography or solution-based nanoparticle fabrication approaches. Highly efficient AR characteristics in the visible spectral range are obtained at optimized refractive indices by controlling the dimensions and average distances of the silica nanoparticle arrays in a level accuracy of tens of nanometers. The AR nanoarrays exhibit sufficient structural durability against the very high strain levels that arise from the flexibility of polymer substrates. This simple coating process provides a cost-effective, high-throughput, room-temperature fabrication solution for producing large-area polymer substrates with AR characteristics.

Graphical abstract: Antireflective silica nanoparticle array directly deposited on flexible polymer substrates by chemical vapor deposition

Supplementary files

Article information

Article type
Paper
Submitted
21 Aug 2012
Accepted
28 Sep 2012
First published
03 Oct 2012

Nanoscale, 2012,4, 7221-7230

Antireflective silica nanoparticle array directly deposited on flexible polymer substrates by chemical vapor deposition

J. Yun, T. Bae, J. Kwon, S. Lee and G. Lee, Nanoscale, 2012, 4, 7221 DOI: 10.1039/C2NR32381H

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