Issue 5, 2013

A stacked polymer film for robust superhydrophobic fabrics

Abstract

A robust superhydrophobic fabric was achieved by depositing a stacked polymer film composed of a poly(1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane) (p(V4D4)) layer and a poly(1H,1H,2H,2H-perfluorodecylacrylate) (p(PFDA)) layer. The polymer film was deposited by initiated chemical vapor deposition (iCVD), a solventless process that allows conformal coating of the stacked polymer film on various micro-structured substrates. The two polymeric layers most likely formed a covalent bonding at their interface, and thus the stacked polymer film was characterized by both strong hydrophobicity and enhanced mechanical robustness originated from highly cross-linked p(V4D4) and p(PFDA). The surface topography of superhydrophobic coating was systematically tunable by controlling the operating parameters of iCVD process and a hierarchical structure was obtained by a simple one-step iCVD process. The film was also highly transparent in the wavelength range from 380 nm to 780 nm. Fabrics coated with this stacked polymer film displayed chemical robustness even after exposure to different chemicals including acetone, toluene, H2SO4, and KOH. The fabric also maintained its water repellency even after 20 000 cycles of the abrasion test and after 75 cycles of the laundry test.

Graphical abstract: A stacked polymer film for robust superhydrophobic fabrics

Supplementary files

Article information

Article type
Paper
Submitted
14 Nov 2012
Accepted
09 Dec 2012
First published
10 Dec 2012

Polym. Chem., 2013,4, 1664-1671

A stacked polymer film for robust superhydrophobic fabrics

Y. Yoo, J. B. You, W. Choi and S. G. Im, Polym. Chem., 2013, 4, 1664 DOI: 10.1039/C2PY20963B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements