Evaporation of water droplets on soft patterned surfaces

Abstract

The evaporation process of a sessile drop of water on soft patterned polydimethylsiloxane (PDMS) substrates is investigated in this study. Different softness of a regular pillar-like patterned PDMS substrate can be achieved by controlling the mixing ratio of a PDMS's prepolymer base and a curing agent at 10 : 1, 20 : 1 and 30 : 1. The receding contact angle is smaller for softer pillar-like patterned substrates. Consequently, the evaporation rate is faster on softer pillar-like substrates. A sessile drop on the regular pillar-like PDMS substrates, prepared at the mixing ratio of a base to a curing agent of 10 : 1 and 20 : 1, is observed to start evaporating in the constant contact radius (CCR) mode then switching to the constant contact angle (CCA) mode via stepwise jumping of the contact line, and finally shifting to the mixed mode sequentially. During the evaporation, a wetting transition from the Cassie to the Wenzel state occurs earlier for the softer substrate because softer pillars relatively cannot stand the increasingly high Laplace pressure. For the softest regular pillar-like PDMS substrate prepared at the mixing ratio of the base to the curing agent of 30 : 1 (abbreviated by PDMS-30 : 1 substrate), the pillars collapse irreversibly after the sessile drop exhibits the wetting transition into the Wenzel state. Furthermore, it is interesting to find out that the initial stage of evaporation of a sessile drop on the PDMS-30 : 1 substrate in the Cassie state is in the CCR mode followed by the CCA mode with stepwise retreatment of the contact line. Further evaporation would induce the wetting transition from the Cassie to the Wenzel state (due to the collapse of pillars) and resume the CCR mode followed by the CCA mode again sequentially.