Issue 37, 2013

Direct extreme UV-lithographic conversion of metal xanthates into nanostructured metal sulfide layers for hybrid photovoltaics

Abstract

We present a versatile strategy toward the preparation of nanostructured metal sulfide layers, which exploits the photosensitivity of metal xanthates as a powerful tool for lithographic structuring. Using extreme ultraviolet interference lithography (EUV-IL), we successfully realized well-defined column and comb nanostructures. This approach provides new pathways to fabricate highly ordered structured metal sulfide layers with periodicities far below 100 nm for potential application in hybrid solar cells.

Graphical abstract: Direct extreme UV-lithographic conversion of metal xanthates into nanostructured metal sulfide layers for hybrid photovoltaics

Supplementary files

Article information

Article type
Communication
Submitted
03 Jul 2013
Accepted
29 Jul 2013
First published
30 Jul 2013
This article is Open Access
Creative Commons BY license

J. Mater. Chem. A, 2013,1, 11135-11140

Direct extreme UV-lithographic conversion of metal xanthates into nanostructured metal sulfide layers for hybrid photovoltaics

T. Rath, C. Padeste, M. Vockenhuber, C. Fradler, M. Edler, A. Reichmann, I. Letofsky-Papst, F. Hofer, Y. Ekinci and T. Griesser, J. Mater. Chem. A, 2013, 1, 11135 DOI: 10.1039/C3TA12592K

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements