Issue 29, 2013

Thiol–epoxy/thiol–acrylate hybrid materials synthesized by photopolymerization

Abstract

Thiol–epoxy/thiol–acrylate hybrid networks with systematic variations (100/0, 75/25, 50/50, 25/75, 0/100, w/w) were prepared by free-radical photoinitiator (ITX) and photo-base generator (TBD·HBPh4) induced photopolymerization. The enhanced spectral sensitivity of TBD·HBPh4 at long wavelengths (320–500 nm) with aid of ITX was capable of in situ generation of a strong base (TBD) to achieve the relatively fast and essentially quantitative thiol–epoxy click reaction. The ITX/TBD·HBPh4 photoinitiating system, which generated both the free radicals and the strong base upon UV exposure, could induce thiol–epoxy/thiol–acrylate hybrid polymerizations. The kinetics investigated with real-time IR indicated that the thiol–acrylate reactions were faster and more efficient than the thiol–epoxy reactions (>95% conversion in a matter of seconds and minutes, respectively), and the thiol conversion increased with an increase in the epoxy concentration. The incorporation of the thiol–epoxy reaction offered several advantages: the polymerization shrinkage decreased with the increase in the thiol–epoxy content due to the low shrinkage factor for the thiol–epoxy system (every mole of epoxy group polymerized produces 6.3 mL of shrinkage). The glass transition temperature of the thiol–epoxy/thiol–acrylate hybrid networks progressively increased as a function of the thiol–epoxy content, also resulting in enhanced mechanical and physical properties. This work will be helpful to make optical and electronic devices with low shrinkage and stress, decreased residual monomers, and improved mechanical properties.

Graphical abstract: Thiol–epoxy/thiol–acrylate hybrid materials synthesized by photopolymerization

Supplementary files

Article information

Article type
Paper
Submitted
25 Feb 2013
Accepted
10 May 2013
First published
17 Jun 2013

J. Mater. Chem. C, 2013,1, 4481-4489

Thiol–epoxy/thiol–acrylate hybrid materials synthesized by photopolymerization

Y. Jian, Y. He, Y. Sun, H. Yang, W. Yang and J. Nie, J. Mater. Chem. C, 2013, 1, 4481 DOI: 10.1039/C3TC30360H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements