Issue 72, 2014

Electrodeposition of gallium in the presence of NH4Cl in an ionic liquid: hints for GaN formation

Abstract

Group III–V semiconductors are important in the production of a variety of optoelectronic devices. At present, these semiconductors are synthesized by high vacuum techniques. Here we report on the electrochemical deposition of GaN which seems to form in quite a thin layer from NH4Cl and GaCl3 in an ionic liquid.

Graphical abstract: Electrodeposition of gallium in the presence of NH4Cl in an ionic liquid: hints for GaN formation

Supplementary files

Article information

Article type
Communication
Submitted
14 May 2014
Accepted
21 Jul 2014
First published
21 Jul 2014
This article is Open Access
Creative Commons BY-NC license

Chem. Commun., 2014,50, 10438-10440

Electrodeposition of gallium in the presence of NH4Cl in an ionic liquid: hints for GaN formation

A. Lahiri, N. Borisenko, A. Borodin and F. Endres, Chem. Commun., 2014, 50, 10438 DOI: 10.1039/C4CC03649B

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