Issue 100, 2014

Spontaneous exfoliation and tailoring of MoS2 in mixed solvents

Abstract

Spontaneous exfoliation of MoS2 is achieved in H2O2–NMP mixed solvents with a yield of over 60 wt%, operated under mild conditions. H2O2-prompted sheet-tailoring effect induces a size evolution of MoS2 nanosheets from micro-scale to nano-scale. Furthermore, the concurrent dissolution also affords an approach to introduce structural defects in the nanosheets.

Graphical abstract: Spontaneous exfoliation and tailoring of MoS2 in mixed solvents

Supplementary files

Article information

Article type
Communication
Submitted
12 Sep 2014
Accepted
21 Oct 2014
First published
24 Oct 2014

Chem. Commun., 2014,50, 15936-15939

Spontaneous exfoliation and tailoring of MoS2 in mixed solvents

L. Dong, S. Lin, L. Yang, J. Zhang, C. Yang, D. Yang and H. Lu, Chem. Commun., 2014, 50, 15936 DOI: 10.1039/C4CC07238C

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