Issue 13, 2014

High-yield fabrication of nm-size gaps in monolayer CVD graphene

Abstract

Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.

Graphical abstract: High-yield fabrication of nm-size gaps in monolayer CVD graphene

Supplementary files

Article information

Article type
Communication
Submitted
04 Apr 2014
Accepted
18 May 2014
First published
22 May 2014

Nanoscale, 2014,6, 7249-7254

Author version available

High-yield fabrication of nm-size gaps in monolayer CVD graphene

C. Nef, L. Pósa, P. Makk, W. Fu, A. Halbritter, C. Schönenberger and M. Calame, Nanoscale, 2014, 6, 7249 DOI: 10.1039/C4NR01838A

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