Issue 18, 2014

Towards a unified description of the charge transport mechanisms in conductive atomic force microscopy studies of semiconducting polymers

Abstract

In this work, conductive atomic force microscopy (C-AFM) is used to study the local electrical properties in thin films of self-organized fibrillate poly(3-hexylthiophene) (P3HT), as a reference polymer semiconductor. Depending on the geometrical confinement in the transport channel, the C-AFM current is shown to be governed either by the charge transport in the film or by the carrier injection at the tip–sample contact, leading to either bulk or local electrical characterization of the semiconducting polymer, respectively. Local IV profiles allow discrimination of the different dominating electrical mechanisms, i.e., resistive in the transport regime and space charge limited current (SCLC) in the local regime. A modified Mott–Gurney law is analytically derived for the contact regime, taking into account the point–probe geometry of the contact and the radial injection of carriers. Within the SCLC regime, the probed depth is shown to remain below 12 nm with a lateral electrical resolution below 5 nm. This confirms that high resolution is reached in those C-AFM measurements, which therefore allows for the analysis of single organic semiconducting nanostructures. The carrier density and mobility in the volume probed under the tip under steady-state conditions are also determined in the SCLC regime.

Graphical abstract: Towards a unified description of the charge transport mechanisms in conductive atomic force microscopy studies of semiconducting polymers

Supplementary files

Article information

Article type
Paper
Submitted
12 May 2014
Accepted
08 Jul 2014
First published
09 Jul 2014

Nanoscale, 2014,6, 10596-10603

Author version available

Towards a unified description of the charge transport mechanisms in conductive atomic force microscopy studies of semiconducting polymers

D. Moerman, N. Sebaihi, S. E. Kaviyil, P. Leclère, R. Lazzaroni and O. Douhéret, Nanoscale, 2014, 6, 10596 DOI: 10.1039/C4NR02577F

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