Issue 31, 2014

Rapid fabrication of silk films with controlled architectures via electrogelation

Abstract

Current methods to produce silk films include casting and spin coating. Here we introduce a new method for the fabrication of silk films: electrogelation. Through use of a closed-loop anode, films with high surface smoothness and optical transparency are produced. Bending the electrode loop allows films with three-dimensional topologies to be formed, possessing thicknesses capable of descending into the submicron thin film regime.

Graphical abstract: Rapid fabrication of silk films with controlled architectures via electrogelation

Supplementary files

Article information

Article type
Communication
Submitted
22 May 2014
Accepted
24 Jun 2014
First published
24 Jun 2014

J. Mater. Chem. B, 2014,2, 4983-4987

Rapid fabrication of silk films with controlled architectures via electrogelation

J. E. Bressner, B. Marelli, G. Qin, L. E. Klinker, Y. Zhang, D. L. Kaplan and F. G. Omenetto, J. Mater. Chem. B, 2014, 2, 4983 DOI: 10.1039/C4TB00833B

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