Issue 59, 2015
From the journal:

Chemical Communications

Ion-precursor and ion-dose dependent anti-galvanic reduction†

Shubo Tian,‡a   Chuanhao Yao,‡a   Lingwen Liao,a   Nan Xiaa  and  Zhikun Wu*a  

* Corresponding authors

a Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanostructures, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, China
E-mail: zkwu@issp.ac.cn

Abstract

Controlling alloy nanoparticles with atomic monodispersity is challenging, and the recently revealed anti-galvanic reduction (AGR) provides a unique solution to this challenge. Herein we demonstrate that AGR is ion-precursor and ion-dose dependent, which offers novel strategies to tune the composition, structure and properties of nanoparticles by varying the ion-precursor and ion-dose in the AGR reaction.

Graphical abstract: Ion-precursor and ion-dose dependent anti-galvanic reduction

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Article information

DOI
https://doi.org/10.1039/C5CC03267A
Article type
Communication
Submitted
20 Apr 2015
Accepted
08 Jun 2015
First published
24 Jun 2015

Chem. Commun., 2015,51, 11773-11776

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Ion-precursor and ion-dose dependent anti-galvanic reduction

S. Tian, C. Yao, L. Liao, N. Xia and Z. Wu, Chem. Commun., 2015, 51, 11773 DOI: 10.1039/C5CC03267A

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