Issue 68, 2015

Anomalous semiconducting behavior on VO2 under high pressure

Abstract

High-pressure electrical transport properties of VO2 have been investigated by in situ resistivity, Hall-effect, and temperature dependence of resistivity measurements. The electrical transport parameters including resistivity, Hall coefficient, carrier concentration, and mobility varies significantly around 10.4 GPa, which can be attributed to the isostructural phase transition of VO2. Temperature dependence of resistivity indicates that the phase transition is a semiconductor-to-semiconductor transformation, not the pressure-induced metallization as previously reported by Raman and IR experiment observations. The dramatic increase of activation energy at 10.4 GPa indicates an increasingly insulating behavior of VO2 accompanied with the isostructural phase transition. The electrical transport properties, especially the carries transportation under compression open up a new possible basis for optimizing the performance of VO2 based applications under ambient or extreme conditions.

Graphical abstract: Anomalous semiconducting behavior on VO2 under high pressure

Article information

Article type
Paper
Submitted
28 Apr 2015
Accepted
17 Jun 2015
First published
17 Jun 2015

RSC Adv., 2015,5, 54843-54847

Author version available

Anomalous semiconducting behavior on VO2 under high pressure

X. Zhang, J. Zhang, F. Ke, G. Li, Y. Ma, X. Liu, C. Liu, Y. Han, Y. Ma and C. Gao, RSC Adv., 2015, 5, 54843 DOI: 10.1039/C5RA07732J

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