Issue 47, 2015

Directly deposited MoS2 thin film electrodes for high performance supercapacitors

Abstract

Two dimensional (2D) layered materials have recently attracted significant research interest owing to their unique physical and chemical properties for efficient electrochemical energy storage devices. Here, we present a neoteric approach to fabricate high performance MoS2 thin film supercapacitor electrodes by using a direct magnetron sputtering technique. The novel three-dimensional (3D) porous structure of the MoS2 film exhibits an excellent capacitance of ∼330 F cm−3 along with a high volumetric power and energy density of 40–80 W cm−3 and 1.6–2.4 mW h cm−3, respectively. Moreover, the optimized MoS2 electrode shows an outstanding cyclic stability, yielding capacitance retention over 97% after 5000 cycles of charging/discharging. The contemporary approach to MoS2 supercapacitor electrode fabrication will enable new opportunities in flexible electronic and energy devices.

Graphical abstract: Directly deposited MoS2 thin film electrodes for high performance supercapacitors

Article information

Article type
Paper
Submitted
09 Oct 2015
Accepted
26 Oct 2015
First published
10 Nov 2015

J. Mater. Chem. A, 2015,3, 24049-24054

Directly deposited MoS2 thin film electrodes for high performance supercapacitors

N. Choudhary, M. Patel, Y. Ho, N. B. Dahotre, W. Lee, J. Y. Hwang and W. Choi, J. Mater. Chem. A, 2015, 3, 24049 DOI: 10.1039/C5TA08095A

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