Issue 85, 2016, Issue in Progress

Reflux precipitation polymerization: a new synthetic insight in molecular imprinting at high temperature

Abstract

The synthesis of uniform molecularly imprinted polymer (MIP) microspheres (MSs) using distillation precipitation polymerization (DPP) at high temperature has attracted great interest in the field of molecular imprinting. However, there are still some shortcomings in this method. In this work, to create uniform MIP MSs in a short time and to demonstrate the effects of high temperature on imprinting performance, a new precipitation polymerization method (reflux precipitation polymerization, RPP) was used for the first time to fabricate MIP MSs in this study. The SEM images of the polymeric MSs indicate the presence of template molecules could improve the particle morphology and size uniformity. The specific molecular recognition of the monodispersed MIP MSs was confirmed by fluorescence measurement and HPLC-UV analysis. The binding behavior of the MIP MSs was simulated using the heterogeneous Freundlich isotherm, which shows that the MIP MSs produced by the RPP possess compatible selectivity in comparison with those produced by traditional PP method. It is noted that, for the first time, we demonstrated that molecular imprinting at high temperature was only successful when electrostatic interactions played important roles in the imprinting process.

Graphical abstract: Reflux precipitation polymerization: a new synthetic insight in molecular imprinting at high temperature

Supplementary files

Article information

Article type
Paper
Submitted
20 Jun 2016
Accepted
20 Aug 2016
First published
22 Aug 2016

RSC Adv., 2016,6, 81491-81499

Reflux precipitation polymerization: a new synthetic insight in molecular imprinting at high temperature

X. Shen, C. Huang, S. Shinde, M. Switnicka-Plak, P. A. G. Cormack and B. Sellergren, RSC Adv., 2016, 6, 81491 DOI: 10.1039/C6RA15990G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements