Issue 6, 2019

Doping of thiolate protected gold clusters through reaction with metal surfaces

Abstract

A new technique is introduced for doping gold nanoclusters by using a metal surface such as Ag, Cu and Cd as a source of heteroatoms. The importance of the thiol ligand in the doping process is examined by following the reactions with MALDI-TOF mass spectrometry in the presence and the absence of the thiols on the surface. The doping reactions depend greatly on the type of the cluster and the availability of the ligand which is a crucial element for alloying. The thiol acts as a messenger exchanging the metal atoms between the cluster and the metal surface as revealed by the XPS studies performed on the metal surfaces.

Graphical abstract: Doping of thiolate protected gold clusters through reaction with metal surfaces

Supplementary files

Article information

Article type
Paper
Submitted
14 Nov 2018
Accepted
22 Jan 2019
First published
23 Jan 2019
This article is Open Access
Creative Commons BY-NC license

Nanoscale, 2019,11, 2938-2945

Doping of thiolate protected gold clusters through reaction with metal surfaces

R. Kazan, U. Müller and T. Bürgi, Nanoscale, 2019, 11, 2938 DOI: 10.1039/C8NR09214A

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