Issue 31, 2022

A bottom-up approach from medium-sized bilayer boron nanoclusters to bilayer borophene nanomaterials

Abstract

Inspired by the experimentally observed bilayer B48−/0 and theoretically predicted bilayer B50–B72 and based on extensive density functional theory calculations, we report herein a series of novel medium-sized bilayer boron nanoclusters C1 B84 (I), C2v B86 (II), C1 B88 (III), C1 B90 (IV), C1 B92 (V), C1 B94 (VI), C2v B96 (VII), and C1 B98 (VIII) which are the most stable isomers of the systems reported to date effectively stabilized by optimum numbers of interlayer B–B σ bonds between the inward-buckled atoms on top and bottom layers. Detailed bonding analyses indicate that these bilayer species follow the universal bonding pattern of σ + π double delocalization, rendering three-dimensional aromaticity in the systems. More interestingly, the AA-stacked bilayer structural motif in B96 (VII) with a B72 bilayer hexagonal prism at the center can be extended to form bilayer C2 B128 (IX), D2h B214 (X), C2v B260 (XI), D2h B372 (XII), and D2 B828 (XIII) which contain one or multiple conjoined B72 bilayer hexagonal prisms sharing interwoven zig-zag boron triple chains between them. Such bilayer species or their close-lying AB isomers can be viewed as embryos of the newly reported most stable freestanding BL-α+ bilayer borophenes and quasi-freestanding bilayer borophenes on Ag(111) which are composed of interwoven zig-zag boron triple chains shared by conjoined BL B72 hexagonal prisms, presenting a bottom-up approach from medium-sized bilayer boron nanoclusters to two-dimensional bilayer borophene nanomaterials.

Graphical abstract: A bottom-up approach from medium-sized bilayer boron nanoclusters to bilayer borophene nanomaterials

Supplementary files

Article information

Article type
Paper
Submitted
28 May 2022
Accepted
19 Jul 2022
First published
19 Jul 2022

Nanoscale, 2022,14, 11443-11451

A bottom-up approach from medium-sized bilayer boron nanoclusters to bilayer borophene nanomaterials

Q. Yan, T. Zhang, Y. Ma, Q. Chen, Y. Mu and S. Li, Nanoscale, 2022, 14, 11443 DOI: 10.1039/D2NR02950B

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